Date: 17/01/2011

AIXTRON delivers six more MOCVD tools to China´s HC SemiTek

AIXTRON SE today announced an order from mainland China. HC SemiTek placed an order for six additional CRIUS Gallium Nitride epitaxial growth reactors. The six machines in the 31x2-inch wafer configuration have been delivered to the company's modern facility in Wuhan.

Metal Organic Chemical Vapour Deposition (MOCVD) tools are used for depositing thin layers of atoms on a semiconductor wafer. The CRIUS MOCVD tools deposit wide bandgap compound semiconductors accurately and supports multiple wafers. AIXTRON says it's CRIUS enables operators to meet the challenge of high brightness LED manufacture with performance and economics.

According to Dr. Rong Liu, President of HC SemiTek, "The CRIUS enables significant operational flexibility and enhanced growth efficiency for state of the art UHB GaN LEDs. Our technology team is highly talented with a rich research experience gained from world leading research institutes. We now wish to extend our manufacturing capacity quickly and conveniently as per our strategic expansion roadmap for the displays environment. While this poses many challenges for providers - how to efficiently create precision epiwafers at very low cost - management through the responsive AIXTRON support team will enable optimized process set-up without incurring project delay."