Date: 18/09/2006

Fujitsu and Advance test plan to venture jointly for the development of mask free electron beam lithography.

Electron beam lithography gives the advantage of printing the patterns of P and N type semiconductors and the interconnects directly on the Silicon wafer disks. This saves lot of resources in developing complex photo masks which are used in the present semiconductor manufacturing equipments. Here this proposed joint venture of Fujitsu and Advance test will lead the development faster. Even though this technology is costly for mass production but will surely be needy one for low volume ASICs and prototyping.

These companies are planning to print/etch at 65nm dimensions on 300 mm wafer.