Date: 02/02/2010

Novellus reaches 1000th VECTOR plasma-enhanced chemical vapor deposition system shipment

Novellus Systems has announced that it has reached the 1000th VECTOR plasma-enhanced chemical vapor deposition (PECVD) system shipment to GLOBALFOUNDRIES' Fab 7 in Singapore.

In the front-end-of-line (FEOL), VECTOR is used to deposit gate spacers and liners, high stress films for straining silicon, amorphous carbon and anti-reflective layers, hard mask films and etch stop layers. Back-end-of-line (BEOL) applications include inter-metal and inter-layer dielectrics, copper diffusion barrier films, low dielectric constant capping layers, and final passivation layers.

The VECTOR system is used to deposit a wide range of dielectric applications such as ultra-low dielectric constant (ULK) films and dielectric layers used in through-silicon-via (TSV) packaging technology.

The new VECTOR system features high capital productivity, low installation and operating costs, small system footprint, high wafer-to-wafer repeatability and, single digit defect performance in the sub-100 nm particle sizes.

"The Novellus VECTOR platform is used in high-volume production at 65nm and in the advanced 45/40nm technology nodes in Fab 7 for both FEOL and BEOL dielectric applications," said Peter Benyon, head of Fab 7 operations at GLOBALFOUNDRIES. "We look forward to continuing our partnership with Novellus in developing cost-effective, advanced technological solutions to help our customers rapidly bring their innovative designs to market."

"We are very pleased to be commemorating this milestone shipment with the company's acceptance of our 1000th tool, as Chartered becomes a part of the new GLOBALFOUNDRIES," said Kevin Jennings, senior vice president of Novellus' PECVD business unit. "Chartered purchased its first VECTOR system in 2004, and had long been an important customer of Novellus. We hope to develop an equally close relationship with GLOBALFOUNDRIES."

For more details visit www.novellus.comNovellus Systems has announced that it has reached the 1000th VECTOR plasma-enhanced chemical vapor deposition (PECVD) system shipment to GLOBALFOUNDRIES' Fab 7 in Singapore.

In the front-end-of-line (FEOL), VECTOR is used to deposit gate spacers and liners, high stress films for straining silicon, amorphous carbon and anti-reflective layers, hard mask films and etch stop layers. Back-end-of-line (BEOL) applications include inter-metal and inter-layer dielectrics, copper diffusion barrier films, low dielectric constant capping layers, and final passivation layers.

The VECTOR system is used to deposit a wide range of dielectric applications such as ultra-low dielectric constant (ULK) films and dielectric layers used in through-silicon-via (TSV) packaging technology.

The new VECTOR system features high capital productivity, low installation and operating costs, small system footprint, high wafer-to-wafer repeatability and, single digit defect performance in the sub-100 nm particle sizes.

"The Novellus VECTOR platform is used in high-volume production at 65nm and in the advanced 45/40nm technology nodes in Fab 7 for both FEOL and BEOL dielectric applications," said Peter Benyon, head of Fab 7 operations at GLOBALFOUNDRIES. "We look forward to continuing our partnership with Novellus in developing cost-effective, advanced technological solutions to help our customers rapidly bring their innovative designs to market."

"We are very pleased to be commemorating this milestone shipment with the company's acceptance of our 1000th tool, as Chartered becomes a part of the new GLOBALFOUNDRIES," said Kevin Jennings, senior vice president of Novellus' PECVD business unit. "Chartered purchased its first VECTOR system in 2004, and had long been an important customer of Novellus. We hope to develop an equally close relationship with GLOBALFOUNDRIES."

For more details visit www.novellus.com