Date: 14/01/2009

Open-Silicon's MAX Technology licensed to Brite Semiconductor

Open-Silicon has announced a MAX licensing agreement with Shanghai based Brite Semiconductor.

Open-Silicon's MAX technology, announced in November of 2008, addresses design issues common to the 65nm and 40nm process nodes. Depending on customer needs, Brite Semiconductor's Shanghai design center will implement the CoreMAXTM, VariMAXTM and PowerMAXTM technologies to build customized silicon with increased performance, managed process variability and lower power.

"The new MAX technology provides tremendous power and performance optimization advantages for our customers' products, regardless of the complexity of their designs," said Charlie Zhi, CEO of Brite Semiconductor. "Design companies in China are moving aggressively to leading-edge technologies. No other ASIC company will be able to offer these advanced design benefits to their China-based customers."

"MAX has been tremendously successful in allowing customers to build the best possible, fully custom silicon for customers' designs or products in smaller process geometries," said Scott Houghton, VP marketing and business development, Open-Silicon. "Brite will be able to enhance its customers' products by taking advantage of the ASIC industry's only transistor-level optimization flow and techniques like adaptive back biasing, which are new to the ASIC space."