Date: 12/03/2025

SEMVision H20 defect inspection semiconductor equipment from Applied to spot nanoscale defects in 2nm chips

Applied Materials announced introduction of world's most advanced new defect review system SEMVision H20 featuring electron beam (eBeam) technology with advanced AI image recognition. This tool can analyse buried nanoscale defects in the world’s most advanced chips such as complex 3D architectured logic chips at the 2nm node and beyond including new Gate-All-Around (GAA) transistors as well as the formation of higher-density DRAM and 3D NAND memories. This defect review systems can analyze exponentially more samples while maintaining the speed and sensitivity required for high-volume production.

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