Date: 15/09/2010

Brion unveils a software tool for ASML's extreme ultraviolet scanners

Brion Technologies, a division of ASML, has introduced a new software tool named Tachyon NXE for predictive modeling for ASML Extreme Ultraviolet Lithography (EUV) scanners; the equipments used in advanced nano-meter node semiconductor chip making.

The Tachyon NXE software package integrates with existing Tachyon products to enable the simulation of the EUV lithography process. Brion has incorporated TWINSCAN NXE:3100 scanner characteristics, models, and data in developing Tachyon NXE to accurately describe the optical performance of the system. Tachyon NXE model can predict and correct NXE-specific effects before the start of chip production and therefore helping to decrease EUV mask re-spins and shorten the learning cycles during final mask development.

Brion says the Optical Proximity Correction (Tachyon OPC+) and Lithography Manufacturability Check (Tachyon LMC) applications from Brion can now incorporate the new software model of ASML's EUV pre-production scanners, six of which will ship before mid-2011.

Brion claims that they have demonstrated the capability to perform full field (~8 cm2) EUV mask data correction in less than 8 hours on a single Tachyon system, in multiple DRAM test cases.

"Tachyon NXE is the result of a multi-year investment by ASML and Brion to accurately model the performance of NXE scanners," said Jim Koonmen, general manager of Brion. "The industry transition to EUV will require a significant learning curve. ASML and Brion are uniquely positioned to help reduce the duration and cost of that curve through Tachyon NXE."