Date: 05/08/2010

Synopsys develop IP supporting GLOBALFOUNDRIES's 28nm High K Metal Gate tech

Synopsys and GLOBALFOUNDRIES have announced an agreement to develop the Synopsys DesignWare SuperSpeed USB (3.0), USB 2.0, HDMI 1.4 Tx and Rx, DDR3/2, PCI Express 2.0 and 1.1, SATA 1.5/3 Gbps and 6 Gbps, and XAUI PHY IP for GLOBALFOUNDRIES' 28-nanometer (nm) "Gate First" High-k Metal Gate (HKMG) process technologies. In semiconductor manufacturing when the nodes are moved to 28nm level the use of High K dielectric material as metal gates enhance the switching speed and helps to reduce the leakage current.

Synopsys support for the HKMG 32/28-nm technology also includes an optimized Lynx Design System, a flow configured for the pre-validated ARM CPA 32/28-nm LP standard cells and memories, and full Synopsys Galaxy Implementation Platform enablement for the 32/28-nm LP technology as part of its support for common platform alliance which includes IBM and Samsung Electronics along with GLOBALFOUNDRIES